We present first results concerning stable formation of primary electronic defects and lithium nanometer sized clusters in LiF thin films grown by ion-assisted thermal deposition. The optical and morphological properties of the as grown LiF films, dependent on the deposition conditions, such as ion-beam energy and ion species (Xe, Ar), are reported. The experimental results show a larger efficiency of low-energy Xe ions in inducing the formation of lithium nano-clusters. To analyse the role of the deposition conditions, a preliminary interpretation of the lithium nano-cluster formation mechanism based on the spherical and/or cylindrical spike thermal model is given. (C) 2003 Elsevier B.V. All rights reserved.
Cricenti, A., Montereali, R.m., Mussi, V., Nichelatti, E., Pilloni, L., Scaglione, S., et al. (2003). Defect generation in low-energy ion-assisted thermal deposited lithium fluoride films. JOURNAL OF NON-CRYSTALLINE SOLIDS, 322(1-3), 111-116 [10.1016/S0022-3093(03)00189-3].
Defect generation in low-energy ion-assisted thermal deposited lithium fluoride films
SOMMA, Fabrizia
2003-01-01
Abstract
We present first results concerning stable formation of primary electronic defects and lithium nanometer sized clusters in LiF thin films grown by ion-assisted thermal deposition. The optical and morphological properties of the as grown LiF films, dependent on the deposition conditions, such as ion-beam energy and ion species (Xe, Ar), are reported. The experimental results show a larger efficiency of low-energy Xe ions in inducing the formation of lithium nano-clusters. To analyse the role of the deposition conditions, a preliminary interpretation of the lithium nano-cluster formation mechanism based on the spherical and/or cylindrical spike thermal model is given. (C) 2003 Elsevier B.V. All rights reserved.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
