Capabilities of the KMC-2 beamline at BESSY for spatially resolved X-ray measurements with micro- and nanometer resolution have been reviewed. A combination of experimental methods of X-ray fluorescence analysis and extended X-ray absorption fine spectroscopy with X-ray standing waves technique was applied for the depth profiling ofSi/W/Si layers with sub-nanometer resolution. The investigated layers were placed into the waveguide structure formed by two Au films to increase sensitivity and accuracy of the measurements. In-depth resolution on the order of I nm for the structure measurements has been obtained. (c) 2007 Elsevier B.V All rights reserved.
Gupta, A., Darowski, N., Zizak, I., Meneghini, C., Schumacher, G., Erko, A. (2007). X-ray measurements with micro- and nanoresolution at BESSY RID F-1396-2011 RID A-4661-2010. SPECTROCHIMICA ACTA, PART B: ATOMIC SPECTROSCOPY, 62(6-7), 622-625 [10.1016/j.sab.2007.02.017].
X-ray measurements with micro- and nanoresolution at BESSY RID F-1396-2011 RID A-4661-2010
MENEGHINI, CARLO;
2007-01-01
Abstract
Capabilities of the KMC-2 beamline at BESSY for spatially resolved X-ray measurements with micro- and nanometer resolution have been reviewed. A combination of experimental methods of X-ray fluorescence analysis and extended X-ray absorption fine spectroscopy with X-ray standing waves technique was applied for the depth profiling ofSi/W/Si layers with sub-nanometer resolution. The investigated layers were placed into the waveguide structure formed by two Au films to increase sensitivity and accuracy of the measurements. In-depth resolution on the order of I nm for the structure measurements has been obtained. (c) 2007 Elsevier B.V All rights reserved.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
