Using a low-temperature technology for polycrystalline Ge deposition, we report on the monolithic integration of an array of near-infrared Ge photodiodes on Si complementary metal-oxide-semiconductor (CMOS) electronics. The integrated microsystem consists of a linear array of 120x120 mum(2) pixels, an analog CMOS multiplexer and a transimpedance amplifier. The resulting photoresponse covers the near-infrared up to 1.6 mum. (C) 2002 American Institute of Physics.

Masini, G., Cencelli, V., Colace, L., De Notaristefani, F., Assanto, G. (2002). Monolithic integration of near-infrared Ge photodetectors with Si complementary metal-oxide-semiconductor readout electronics. APPLIED PHYSICS LETTERS, 80(18), 3268-3270 [10.1063/1.1477267].

Monolithic integration of near-infrared Ge photodetectors with Si complementary metal-oxide-semiconductor readout electronics

COLACE, Lorenzo;ASSANTO, GAETANO
2002-01-01

Abstract

Using a low-temperature technology for polycrystalline Ge deposition, we report on the monolithic integration of an array of near-infrared Ge photodiodes on Si complementary metal-oxide-semiconductor (CMOS) electronics. The integrated microsystem consists of a linear array of 120x120 mum(2) pixels, an analog CMOS multiplexer and a transimpedance amplifier. The resulting photoresponse covers the near-infrared up to 1.6 mum. (C) 2002 American Institute of Physics.
2002
Masini, G., Cencelli, V., Colace, L., De Notaristefani, F., Assanto, G. (2002). Monolithic integration of near-infrared Ge photodetectors with Si complementary metal-oxide-semiconductor readout electronics. APPLIED PHYSICS LETTERS, 80(18), 3268-3270 [10.1063/1.1477267].
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11590/120673
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