Hard coatings like titanium nitride (TiN) normally contain a high degree of internal stress (usually compressive in-plane parallel with the surface) owing to growth defects developed during the deposition process and thermal mismatch effects after final cooling; it is, therefore, difficult to produce single-layer TiN coatings thicker than 6-7 mu m, without adhesion problems. In the present study, thick coatings (i.e. > 10 mu m) have been achieved by alternate multilayering of TiN with Ti interlayers, leading to a tougher and less-stressed film. However, having a constant distribution of titanium interlayer thickness is not necessarily the best solution to achieve maximum performance in terms of wear resistance and hardness. The residual stress distribution along the thickness is unlikely to be constant with the inner layers being more stressed due to a greater amount of thermal differential strain. Following this guideline, a series of numerical simulations was performed in order to calculate the residual stress through thickness distribution due to the deposition process. Three sets of multilayered Ti/TiN coatings having both constant and variable Ti interlayer thickness were modelled and deposited, using a reactive arc PVD process. Mechanical and turbological properties were characterized using static and depth sensing Vickers micro-hardness indentation tests, rotating wheel (dimpling grinder) abrasive wear tests and Rockwell C adhesion tests. Coating interface characterizations were made by SEM-EDS. Results showed that adhesion can be significantly improved by adopting a titanium through thickness quantity increasing towards the interface: an optimized distribution allows also higher hardness and wear resistance to be obtained, as it requires a lower total amount of titanium to obtain good adhesion properties. (c) 2006 Elsevier B.V. All rights reserved.
Bemporad, E., Sebastiani, M., Pecchio, C., De Rossi, S. (2006). High thickness Ti/TiN multilayer thin coatings for wear resistant applications. SURFACE & COATINGS TECHNOLOGY, 201(6), 2155-2165 [10.1016/j.surfcoat.2006.03.042].
High thickness Ti/TiN multilayer thin coatings for wear resistant applications
BEMPORAD, Edoardo;SEBASTIANI, MARCO;
2006-01-01
Abstract
Hard coatings like titanium nitride (TiN) normally contain a high degree of internal stress (usually compressive in-plane parallel with the surface) owing to growth defects developed during the deposition process and thermal mismatch effects after final cooling; it is, therefore, difficult to produce single-layer TiN coatings thicker than 6-7 mu m, without adhesion problems. In the present study, thick coatings (i.e. > 10 mu m) have been achieved by alternate multilayering of TiN with Ti interlayers, leading to a tougher and less-stressed film. However, having a constant distribution of titanium interlayer thickness is not necessarily the best solution to achieve maximum performance in terms of wear resistance and hardness. The residual stress distribution along the thickness is unlikely to be constant with the inner layers being more stressed due to a greater amount of thermal differential strain. Following this guideline, a series of numerical simulations was performed in order to calculate the residual stress through thickness distribution due to the deposition process. Three sets of multilayered Ti/TiN coatings having both constant and variable Ti interlayer thickness were modelled and deposited, using a reactive arc PVD process. Mechanical and turbological properties were characterized using static and depth sensing Vickers micro-hardness indentation tests, rotating wheel (dimpling grinder) abrasive wear tests and Rockwell C adhesion tests. Coating interface characterizations were made by SEM-EDS. Results showed that adhesion can be significantly improved by adopting a titanium through thickness quantity increasing towards the interface: an optimized distribution allows also higher hardness and wear resistance to be obtained, as it requires a lower total amount of titanium to obtain good adhesion properties. (c) 2006 Elsevier B.V. All rights reserved.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.