Benvenuti nell'Anagrafe della Ricerca d'Ateneo
La valutazione delle attività di ricerca che si svolgono nelle università ha assunto un'importanza rilevante sia per l'intero sistema universitario sia all'interno di ogni singolo ateneo. Roma Tre si è quindi dotata di idonei strumenti informativi in grado di supportare al meglio le azioni di monitoraggio e di valutazione delle attività di ricerca svolte nei propri dipartimentied ha realizzato una Anagrafe della Ricerca di Ateneo.
EnglishClassical molecular-dynamics simulations based on the Tersoff potential are used to compute at the atomic level the strain-induced potential well generated at the surface of the capping layer by a buried, three-dimensional Ge island on Si(001). A simple model is outlined in order to predict the configurational arrangement for the nucleation of small Ge islands in such a potential well. The theoretical predictions are compared with atomic force microscope images of multilayered SiGe nanostructures grown by chemical vapor deposition. The cluster configuration is shown to be strongly dependent on the capping layer thickness, and to closely mimic the behavior predicted by the model. (c) 2005 American Institute of Physics.
Marchetti R, Montalenti F, Miglio L, Capellini G, De Seta M, & Evangelisti F (2005). Strain-induced ordering of small Ge islands in clusters at the surface of multilayered Si-Ge nanostructures. APPLIED PHYSICS LETTERS, 87(26), 261919-261919-3 [10.1063/1.2151250].
| Titolo: | Strain-induced ordering of small Ge islands in clusters at the surface of multilayered Si-Ge nanostructures | |
| Autori: | ||
| Data di pubblicazione: | 2005 | |
| Rivista: | ||
| Citazione: | Marchetti R, Montalenti F, Miglio L, Capellini G, De Seta M, & Evangelisti F (2005). Strain-induced ordering of small Ge islands in clusters at the surface of multilayered Si-Ge nanostructures. APPLIED PHYSICS LETTERS, 87(26), 261919-261919-3 [10.1063/1.2151250]. | |
| Abstract: | Classical molecular-dynamics simulations based on the Tersoff potential are used to compute at the atomic level the strain-induced potential well generated at the surface of the capping layer by a buried, three-dimensional Ge island on Si(001). A simple model is outlined in order to predict the configurational arrangement for the nucleation of small Ge islands in such a potential well. The theoretical predictions are compared with atomic force microscope images of multilayered SiGe nanostructures grown by chemical vapor deposition. The cluster configuration is shown to be strongly dependent on the capping layer thickness, and to closely mimic the behavior predicted by the model. (c) 2005 American Institute of Physics. | |
| Handle: | http://hdl.handle.net/11590/135072 | |
| Appare nelle tipologie: | 1.1 Articolo in rivista |
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